Innovative planar - rotational magnetron spraying device modern mono and multicomponent coverings for synthesis
DOI:
https://doi.org/10.46299/j.isjea.20250405.04Keywords:
Magnetron, vacuum, target, erosion, circular involute, substrate IntroductionAbstract
In optics , electronics , medicine , renewable In energy , ecology And Existing in other fields of science or technology Challenges today requires that By them Used Materials to have Special Features, quality And To achieve economic Efficiency . Accordingly , it acquires special importance. Innovative , ecologically Clean High Technology Development And Their For commercialization Promotion . In a vacuum Magnetron Spraying The very technologies In line Belongs to , whose Meaning Especially It was revealed Modern In the presence of challenges . The same is indicated by scientific Literature Review also . Researchers Vacuum In the environment Stationary planar magnetron Spraying At the time Thin With the receipt of the deposits Regarding Important Difficulties are faced with . A detailed study of this technique-technology allows for a logical explanation of the existing difficulties. This Difficulties Includes Significant changes observed during production processes Economic Losses And as Technological processes, as well as the resulting Results instability , which It is unambiguously determined by the target. Spraying Zone Inhomogeneity. The inhomogeneity of the sputtering zone, in turn, is caused by the specific configuration of the magnetic field on and near the target surface and its static nature. In this article, we will discuss an innovative solution related to the technology of planar magnetron sputtering in vacuum. We present a planar-rotary magnetron sputtering device that can successfully solve the difficulties faced by magnetron sputtering in vacuum and, accordingly, make a breakthrough in materials science, especially in the direction of the synthesis of mono- and multi-component thin coatings.
References
1) Corbani, J. (1975) Cathode sputtering apparatus, Patent USA 3 878 085, Priority 5/07/1973.
2) Chapin, J. (1979) Sputtering process and apparatus, Patent USA 4 166 018, Priority 31/01/1974.
3) Chapin, J. (1974) The planar magnetron, Research Development, 25 (1),37-40.
4) Shin, S. J., Bae, J. H., Engwall, A. M., Bayu Aji, L.B., Baker, A. A., Taylor, G. V., et al (2024), Deposition of ultrathick heavy-metal alloys on rotating substrates by high-power impulse magnetron sputtering: Target erosion effects, J. Appl. Phys. 135, 035301, California 94550, USA. doi: 10.1063/5.0186803.
5) Handan Huang, Li Jiang, Yiyun Yao, Zhong Zhang, Zhanshan Wang, Runze Qi, (2021) Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution, Coatings, 11(5), https://doi.org/10.3390/coatings11050599
6) Bräuer, G. (2014), Films and Coatings: Technology and Recent Development, in Comprehensive Materials Processing, 4.03.6. Reactive Sputtering. https://doi.org/10.1016/B978-0-08-096532-1.00403-9.
7) Lenis, J.A., Bejarano,G., Rico, P., JGómez Ribelles,L Bolívar,F.J., (2019), Development of multilayer Hydroxyapatite - Ag/TiN-Ti coatings deposited by radio frequency magnetron sputtering with potential application in the biomedical field, Surface and Coatings Technology, Vol. 377, 124856. https://doi.org/10.1016/j.surfcoat.2019.06.097.
8) Nabeel, A., Khan, J.,Vaigunthan, P., Mayada. A., Ashutosh,S., at al (2024), Recent Advances in Aluminum Nitride (AlN) Growth by Magnetron Sputtering Techniques and Its Applications, This article belongs to the Special Issue Advanced Inorganic Semiconductor Materials,2ndEdition, https://doi.org/10.3390/inorganics12100264.
9) Karen,A., Neri,E., José,A., Andraca,A., Domínguez,C., Francisco,G.,et al (2024), MnO/ZnO:Zn Thin-Film Frequency Adaptive Heterostructure for Future Sustainable MemristiveSystems,Nanomaterials 2024,14(8),659.https://doi.org/10.3390/nano14080659
10) Young Hyun Jo, Cheongbin Cheon , Heesung Park & Hae June Lee (2023) Particle-in-Cell Simulations for the Improvement of the Target Erosion Uniformity by the Permanent Magnet Configuration of DC Magnetron Sputtering Systems, Coatings 2023, 13(4),749, https://doi.org/10.3390/coatings13040749
11) Bibhuti B. Sahu, (2024), Overall aspect for designing magnetron sputtering plasma sources and their applications in the deposition of ITO films, Volume 14, Issue 5, AIP Advances 14, 050702, https://doi.org/10.1063/6.0003496
12)Xiang Dong, Yuanjie Su, Zhiming Wu, Xiangdong Xu, Zihao Xiang, Yuanlin Shi, Wenyu Chen, Jinhong Dai, Zhangying Huang, Tao Wang, Yadong Jiang, (2021), Reactive pulsed DC magnetron sputtering deposition of vanadium oxide thin films: Role of pulse frequency on the film growth and properties, Applied Surface Science, Vol. 562, 150138. https://doi.org/10.1016/j.apsusc.2021.150138
13) Xiang, D., Yuanjie, S., Zhiming, Wu., Xiangdong, Xu., Zihao, X., Yuanlin, Shi., et al (2021), Reactive pulsed DC magnetron sputtering deposition of vanadium oxide thin films: Role of pulse frequency on the film growth and properties, Applied Surface Science Vol. 562, 150138. https://doi.org/10.1016/j.apsusc.2021.150138
14) .Chang, Liu., Zhi, Zheng., Xing, Li., Yang, Wang., Xiang, Dong., Gaoshan, Huang., et al (2024), Low-temperature growth of high-quality VO2 epitaxial film on c-plane sapphire by reactive magnetron sputtering, Appl. Phys. Lett. 125, 071904. https://doi.org/10.1063/5.0219061
15) Berishvili, Z., Gadakhabadze, I., Dekanozishvili, G., Kipiani, M., Kordzakhia, I., Skhiladze, G. (2023), Research and Development of an Innovative Planar-Rotational Magnetron Sputtering Device for Obtaining Advanced Materials, BULLETIN OF THE GEORGIAN NATIONAL ACADEMY OF SCIENCES, vol. 17, no. 2, pp 51-57.
16) Беришвили,З.В., Схиладзе,Г.А., Шиошвили,Ш.И. (1983) А.с. 1160761, Устройство ионно-плазменного распыления в вакууме.
17) Беришвили,З.В., Гадахабадзе,И.Г., Схиладзе,Г.А., Шиошвили,Ш.И., (1984) А.с. 1244960, Устройство ионно-плазменного распыления материалов в вакууме.
18) ბერიშვილი, ზ, (2016) პლანარული მაგნეტრინული გაფრქვევის მოწყობილობა, საქართველოს პატენტი GE P 2016 6512 B, Appl. for International Patent, WIPO|PCT, WO 2016/189337 A1, Appl. of India Patent, № 201717040689.
19) Kipiani, M.J. (2020) Planar reactive magnetron sputtering to obtain dielectrics and transparent conductive thin films, International Journal of New Technology and Research (IJNTR), 6, Issue-6: 45-50. https://doi.org/10.31871/IJNTR.6.6.11.19.
20) Berishvili, Z., Gadakhabadze, I., Kordzakhia, I., Dekanozishvili G. (2017) Planar magnetron sputtering device: a new generation of magnetron sputtering design and technology, Journal of Physical Science and Application, 7 (5): 28-39, USA. https://doi.org/10.17265/21595348/2017.05.003
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Copyright (c) 2025 Zaur Berishvili, Marina Kipiani, Iuri Papava, Bela Kvirkvelia
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